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H2 diffusion barrier formation by nitrogen incorporation in...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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HDP-CVD deposition process for filling high aspect ratio gaps

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Hexakis(monohydrocarbylamino)disilanes and method for the...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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High density plasma chemical vapor deposition (HDP-CVD)...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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High reflector tunable stress coating, such as for a MEMS...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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High temperature interface layer growth for high-k gate...

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High-pressure anneal process for integrated circuits

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Horizontal coffee-stain method using control structure to...

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HSQ with high plasma etching resistance surface for borderless v

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