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Ultra-thin SiO2using N2O as the oxidant

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate

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Use of oxalyl chloride to form chloride-doped silicon dioxide fi

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Patent

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UV-enhanced oxy-nitridation of semiconductor substrates

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate

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