4. Semiconductor device manufacturing: process
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Layering nitrided oxide on a silicon substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Liquid phase deposition method for growing a titanium dioxide on

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low dielectric (low k) barrier films with oxygen doping by...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low dielectric constant dielectric films and process for making

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low metallic impurity SiO based thin film dielectrics on...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low temperature method for forming a thin, uniform oxide

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Low-K Dielectric layer and method of making same

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Low-temperature plasma-enhanced chemical vapor deposition of...

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Lower temperature method for forming high quality...

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