Hardmask of amorphous carbon-hydrogen (a-C:H) layers with...
HDP-CVD dep/etch/dep process for improved deposition into...
HDP-CVD method for spacer formation
HDP-CVD multistep gapfill process
High aspect ratio shallow trench using silicon implanted oxide
High density plasma chemical vapor deposition process
High density plasma chemical vapor deposition process
High density selective SiO.sub.2 :Si.sub.3 N.sub.4 etching using
High resist-selectivity etch for silicon trench etch...
High selectivity BPSG to TEOS etchant
High selectivity collar oxide etch processes
High selectivity SiC etch in integrated circuit fabrication
High sensitive micro-cantilever sensor and fabricating...
High-density plasma (HDP) chemical vapor deposition (CVD)...
Hole pattern forming method and semiconductor device...
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In situ method for cleaning silicon surface and forming...
In-situ etch of BARC layer during formation of local interconnec
Inert plasma gas surface cleaning process performed insitu...
Innovative method of hard mask removal