Pattern forming method and manufacturing method of...

Details Pattern forming method and manufacturing method of... Pattern forming method and manufacturing method of...

2005-01-14

2010-12-14

Sandvik, Benjamin P (Department: 2826)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S700000

Reexamination Certificate

active

07851363

ABSTRACT:
A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask.

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