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Image sensor having test patterns for measuring characteristics

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspecting method for mask for producing semiconductor device

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method of circuit substrate

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Inspection system for original with pellicle

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Label inspection machine

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Laser scanning method and apparatus for rapid precision measurem

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Laser scanning method and apparatus for rapid precision measurem

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Laser-beam, pattern drawing/inspecting apparatus

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Lead inspection system for surface-mounted circuit packages

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Lead inspection system for surface-mounted circuit packages

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Linear filter based wavelength locking optical sub-assembly...

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Linear-scanning, oblique-viewing optical apparatus

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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