Laser-beam, pattern drawing/inspecting apparatus

Details Laser-beam, pattern drawing/inspecting apparatus Laser-beam, pattern drawing/inspecting apparatus

1986-11-28

1989-03-07

Rosenberger, Richard A.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356431, 356398, C01B 700

Patent

active

048100951

ABSTRACT:
A laser-beam, pattern drawing/inspecting apparatus comprises a reciprocating stage for supporting a printed substrate having an etchant-resistant resist layer coated on it, a laser-beam scanning device having a laser for selectively emitting a first laser beam and a second laser beam less intense than the first laser beam, and an optical system for guiding the first and second laser beams to the printed substrate along the same optical path, the first laser beam scanning the resist layer to draw a pattern thereon, and the second laser beam scanning the resist layer, and a pattern inspection device for receiving the second laser beam reflected from the resist layer, thereby to optically inspect the pattern drawn on the resist layer.

REFERENCES:
patent: 4271334 (1981-06-01), Yardy
patent: 4566016 (1986-01-01), Masuda
patent: 4651169 (1987-03-01), Muka

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