Image sensor having test patterns for measuring characteristics

Details Image sensor having test patterns for measuring characteristics Image sensor having test patterns for measuring characteristics

1999-06-25

2000-07-11

Font, Frank G.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356402, 356407, G01B 1100

Patent

active

060881127

ABSTRACT:
The present invention relates to an image sensor; and, more particularly, to an image sensor having test patterns for measuring characteristics of color filters. In accordance with the present invention, the separate quartz wafer or glass wafer is not required. Therefore, unnecessary cost can be saved and high price of light measuring instrument is not necessary any longer, because it is possible to measure the characteristic of exact color filter on substantial wafer. Moreover, since the measurement of color filter is available on the silicon wafer where substantial image sensor is manufactured, the results of measurement are much more exact and it is possible to promptly apply the results to successive wafer or lot. Thus, it contributes to the improvement of yield of the image sensors.

REFERENCES:
patent: 5841159 (1998-11-01), Lee et al.

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