Inspecting method for mask for producing semiconductor device

Details Inspecting method for mask for producing semiconductor device Inspecting method for mask for producing semiconductor device

1984-06-15

1986-05-06

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356 71, 356389, G01N 2100

Patent

active

045868220

ABSTRACT:
A method for inspecting the presence of foreign particles on a mask comprising the steps of forming alignment marks on a wafer onto which the pattern is trially replicated, aligning projected images by means of the alignment marks to form overlapped images of the pattern of a mask to be inspected and the pattern of another mask in which the light and dark areas are inverted on a photosensitive material on the wafer, and inspecting the exposure status of the photosensitive material on the wafer after development to identify defects such as foreign particles attached to the mask to be inspected.

REFERENCES:
patent: 1135919 (1915-04-01), Pilkington
patent: 2470877 (1949-05-01), Stuland
patent: 4385838 (1983-03-01), Nakazawa et al.
patent: 4468120 (1984-08-01), Tanimoto et al.

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