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Making epitaxial semiconductor device

Metal treatment – Barrier layer stock material – p-n type – Having at least three contiguous layers of semiconductive...
Reexamination Certificate

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Mask material for low temperature selective growth of silicon or

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Mass production of cross-section TEM samples by focused ion...

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
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Material for light emitting element and method for crystal growt

Metal treatment – Barrier layer stock material – p-n type – With contiguous layer doped to degeneracy
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Mercury chalcogenide contact for semiconductor devices

Metal treatment – Barrier layer stock material – p-n type
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Method and structure for forming a trench within a semiconductor

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
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Method for fabricating a monolithic integration of a laser diode

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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Method for forming integrated circuits bearing polysilicon of re

Metal treatment – Barrier layer stock material – p-n type
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Method for heat treatment of silicon wafers and silicon wafer

Metal treatment – Barrier layer stock material – p-n type
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Method for heat-treating gallium arsenide monocrystals

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
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Method for improved alignment for semiconductor devices with bur

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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Method for low temperature bonding and bonded structure

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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Method for passivating a compound semiconductor surface and devi

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
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Method for plasma etching tapered and stepped vias

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
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Method for producing an electronically passivated surface on cry

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
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Method for producing high-aspect ratio hollow diffused regions i

Metal treatment – Barrier layer stock material – p-n type
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Method for the growth of epitaxial metal-insulator-metal-semicon

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
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Method of forming GaAs/AlGaAs hetero-structure and GaAs/AlGaAs h

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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Method of forming microcrystalline silicon-containing silicon ca

Metal treatment – Barrier layer stock material – p-n type
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Method of forming thermally stable high resistivity regions in n

Metal treatment – Barrier layer stock material – p-n type
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