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Defect free trench isolation devices and method of fabrication

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Defect-free semiconductor templates for epitaxial growth

Metal treatment – Barrier layer stock material – p-n type
Reexamination Certificate

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Device for patterned films

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Reexamination Certificate

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Dielectric thin film and method of manufacturing same

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Dielectrically isolated semiconductor substrate

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Disordered crystalline semiconductor

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Patent

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Dual use of epitaxy seed crystal as tube input window and cathod

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Patent

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Dual-masked field isolation

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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