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Wafer alignment mark utilizing parallel grooves and process

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Wafer and method of working the same

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Wafer construction for making single-crystal semiconductor devic

Metal treatment – Barrier layer stock material – p-n type
Patent

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Wafer having a laser mark on chamfered edge

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Wafer having chamfered bend portions in the joint regions betwee

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Wafer marking

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Reexamination Certificate

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Wafer of semiconductor material for fabricating integrated devic

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Wear resistant rails having capability of preventing propagation

Metal treatment – Barrier layer stock material – p-n type
Patent

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