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Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method of manufacturing printing plate and method of...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method of manufacturing single-wafer tunneling sensor

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method of post-etching a mechanically treated substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method of producing a pyroelectric infrared radiation detector

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound

Method of protecting silicon wafers during wet chemical etching

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation

Method of providing a patterned relief of cured photoresist on a

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method of reducing pattern pitch in integrated circuits

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist

Method of treating an insulting layer

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist

Method of treating an isulating layer

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method of wet etching aluminum oxide to minimize undercutting

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Method to control artifacts of microstructural fabrication

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Method to produce masking

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Methods and apparatus for forming submicron patterns on films

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Methods and apparatus for forming submicron patterns on films

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Methods for anisotropic etching of (100) silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist

Methods for patterning using liquid embossing

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Methods of etching articles via microcontact printing

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Methods of etching articles via microcontact printing

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound

Methods of etching silicon-oxide-containing compositions