Method of producing a pyroelectric infrared radiation detector

Details Method of producing a pyroelectric infrared radiation detector Method of producing a pyroelectric infrared radiation detector

1995-07-31

1997-09-02

Gorgos, Kathryn L.

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

20419215, 20419217, 216 55, 216 95, 216101, G01J 506

Patent

active

056628188

ABSTRACT:
A pyroelectric infrared radiation detector for detecting the intensity of infrared radiation with a pyroelectric element is provided. The pyroelectric infrared radiation detector comprises a substrate made of a single crystal material such as (100) magnesium oxide and an infrared radiation detecting structure which comprises a first electrode disposed on the substrate, a pyroelectric thin film disposed on the first electrode, and a second electrode disposed on the pyroelectric thin film for absorption of infrared radiation. The substrate has a recess provided in the upper surface thereof where the infrared radiation detecting structure is seated. A method of producing the pyroelectric infrared radiation detector comprises a first step of forming a first electrode on one surface of a substrate, a second step of forming a pyroelectric thin film on the first electrode, a third step of forming a second electrode on the pyroelectric thin film, a fourth step of providing etching apertures in the first electrode which are open to the substrate, and a fifth step of providing by wet etching process at least one recess in the surface of the substrate where the first electrode is seated.

REFERENCES:
patent: 4532424 (1985-07-01), Cheung
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patent: 5286975 (1994-02-01), Ogura et al.
patent: 5293041 (1994-03-01), Kruse, Jr.
patent: 5369280 (1994-11-01), Liddiard
patent: 5413667 (1995-05-01), Fujii et al.

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