Methods and apparatus for forming submicron patterns on films

Details Methods and apparatus for forming submicron patterns on films Methods and apparatus for forming submicron patterns on films

2006-03-21

2006-03-21

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

C216S002000, C216S011000, C428S161000, C427S457000, C427S458000

Reexamination Certificate

active

07014786

ABSTRACT:
A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.

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