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FIB milling of copper over organic dielectrics

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Film formation apparatus and method of using the same

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Film removal employing a remote plasma source

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Film removal method and apparatus

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Fin structure formation

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Fine pattern forming method and fine pattern device

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Fluorine free integrated process for etching aluminum...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Gas composition for dry etching and process of dry etching

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Gas distribution system

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Gas-phase etching and regrowth method for Group III-nitride crys

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Hermetic low dielectric constant layer for barrier applications

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High aspect ratio contacts

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High aspect ratio etch using modulation of RF powers of...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High etch rate residue free metal etch process with low frequenc

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High frequency plasma process wherein the plasma is executed by

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High pressure high non-reactive diluent gas content high...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High selectivity etch using an external plasma discharge

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High-density plasma etching of carbon-based low-k materials...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High-density plasma, organic anti-reflective coating etch...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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High-frequency semiconductor wafer processing apparatus and meth

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