High frequency plasma process wherein the plasma is executed by

Details High frequency plasma process wherein the plasma is executed by High frequency plasma process wherein the plasma is executed by

1996-10-28

1999-10-12

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

156345, 118723I, 118723IR, 31511121, H05H 100

Patent

active

059650346

ABSTRACT:
A process for fabricating a product including the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a plasma excited by a high frequency field provided by an inductive coupling structure in which the phase and anti-phase capacitive currents into the plasma are substantially balanced.

REFERENCES:
patent: 4918031 (1990-04-01), Flamm et al.
patent: 5241245 (1993-08-01), Barnes et al.
patent: 5346578 (1994-09-01), Benzing et al.
patent: 5534231 (1996-07-01), Savas
Sevick, J., (1991) "Baluns" in: Transmission Line Transformers, 2nd Edition, The American Radio Relay League, Connecticut, pp. 9-1 to 9-3.

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