Gas distribution system

Details Gas distribution system Gas distribution system

1993-02-11

1995-09-19

Breneman, R. Bruce

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

156345, 216 79, H01L 2100

Patent

active

054512905

ABSTRACT:
Improved apparatus and a method for reducing polymerparticle contamination of semiconductor wafers being processed in a system for plasma-etching silicon dioxide. A quartz gas distribution plate contains a number of gas inlet holes having cross-sectional areas sufficiently small to prevent plasma from being present in the gas inlet holes to inhibit formation of polymer material and flaking of contamination particles therefrom. The gas inlet holes are formed on the surface of the quartz gas distribution plate directly over a wafer being processed. Alternatively, the gas inlet holes are formed in the quartz plate to radially extend to the peripheral edge of the quartz plate so that contamination particles, if any, fall outside the bounds of a wafer beneath the quartz plate. The method disclosed includes the step of feeding CHF.sub.3 gas through the gas inlet holes having cross-sectional areas sufficiently small to prevent formation of polymer within the holes and subsequent flaking and contamination of a wafer being processed.

REFERENCES:
patent: 4134817 (1978-01-01), Bourdon
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4339297 (1981-04-01), Aigo
patent: 4436534 (1984-03-01), Bernacki et al.
patent: 4595434 (1986-09-01), Giammarco et al.
patent: 4612077 (1986-09-01), Tracy et al.
patent: 4617079 (1986-10-01), Tracy et al.
patent: 4820371 (1989-04-01), Rose
patent: 4838990 (1987-07-01), Jucha et al.
patent: 4859304 (1989-08-01), Cathey et al.
patent: 4931135 (1990-06-01), Horiuchi et al.
patent: 4949068 (1990-07-01), Davis et al.
patent: 4960488 (1990-10-01), Law et al.
patent: 5006520 (1991-04-01), Hijikata et al.
patent: 5009738 (1991-04-01), Gruenwald et al.
"Silicon Processing for the VLSI Era"--vol. 1--Process Technology--Wolf et al.; 201 1986; Lattice Press; Sunset Beach Calif.; ISBN 0-961672-3-7; pp. 550-551.
European Search Report.

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