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Reactive Ion Etching chamber design for flip chip...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Reactive ion etching of alumina/TiC substrates

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Remote plasma cleaning method for processing chambers

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Remote plasma cleaning source having reduced reactivity with...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Removal of post-RIE polymer on Al/Cu metal line

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Removal of process residues on the backside of a substrate

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Residue removal by CO2 water rinse in conjunction with post...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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RF antenna having high temperature, oxidation resistant coating

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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RF plasma method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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RF plasma reactor with hybrid conductor and multi-radius...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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