Search
Selected: C

Capture system employing annular fluid stream

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Capture system employing diverter fluid nozzle

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Composite shadow ring equipped with a sacrificial inner ring

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Composition and method for polishing...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Confinement device for use in dry etching of substrate...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Contaminant removal by laser-accelerated fluid

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Controlled polymerization on plasma reactor wall

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Controlled potential plasma source

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Copper-clad board suitable for making hole with carbon...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Cyanuric fluoride and related compounds for anisotropic etching

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0
  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.