Determining manufacturability of lithographic mask by...

Determining manufacturability of lithographic mask by...

Displacing edge segments on a fabrication layout based on...

Dummy pattern design for reducing device performance drift

Efficient isotropic modeling approach to incorporate...

Efficient method and computer program for modeling and...

Electron beam patterning

Electronic design for integrated circuits based on process...

Evaluation method for interconnects interacted with...

Fabrication method for semiconductor device, exposure...

Gate modeling for semiconductor fabrication process effects

Generic non-volatile service layer

Grid-based fragmentation for optical proximity correction in...

Hierarchical compression for metal one logic layer

Impurity concentration distribution predicting method and...

Incremental concurrent processing for efficient computation...

Integrated circuits and methods of design and manufacture...

Integrated OPC verification tool

Integration of open space/dummy metal at CAD for physical...

Intelligent pattern signature based on lithography effects