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Mask data processing method for optimizing hierarchical...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Mask pattern data generating method, information processing...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
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Mask patterns for use in multiple-exposure lithography

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
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Mask-pattern determination using topology types

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
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Matching method for designing layout patterns on a photomask...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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MEEF reduction by elongation of square shapes

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Merging sub-resolution assist features of a...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Yield
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Method and apparatus for correcting assist-feature-printing...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
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Method and apparatus for detecting lithographic hotspots in...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and apparatus for determining a process model that...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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Method and apparatus for determining the effect of process...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and apparatus for inserting metal fill in an...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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Method and apparatus for modeling long-range EUVL flare

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and apparatus for performing stress modeling of...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Yield
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Method and apparatus for using a database to quickly...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and program for pattern data generation using a...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and system for a pattern layout split

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
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Method and system for correcting a mask pattern design

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and system for implementing parallel processing of...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Method and system for post-routing lithography-hotspot...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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