Intelligent pattern signature based on lithography effects

Details Intelligent pattern signature based on lithography effects Intelligent pattern signature based on lithography effects

2011-06-21

2011-06-21

Garbowski, Leigh Marie (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Layout generation

C716S052000

Reexamination Certificate

active

07966586

ABSTRACT:
The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.

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