Integrated circuits and methods of design and manufacture...

Details Integrated circuits and methods of design and manufacture... Integrated circuits and methods of design and manufacture...

2010-07-20

2011-12-13

Garber, Charles (Department: 2812)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Layout generation

C716S050000, C716S054000, C716S056000, C716S106000, C716S109000, C716S120000, C716S122000, C716S123000, C716S132000, C716S133000, C257S368000, C257S605000, C257SE27060, C257SE27009

Reexamination Certificate

active

08078998

ABSTRACT:
Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes using a first mask to pattern a gate material forming a plurality of first and second features. The first features form gate electrodes of the semiconductor devices, whereas the second features are dummy electrodes. Based on the location of these dummy electrodes, selected dummy electrodes are removed using a second mask. The use of the method provides greater flexibility in tailoring individual devices for different objectives.

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