Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2011-06-14
2011-06-14
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
C716S055000, C716S111000, C716S119000, C716S136000
Reexamination Certificate
active
07962867
ABSTRACT:
An electronic design is generated for an integrated circuit that is to be fabricated in accordance with the electronic design by a process that will impart topographically induced feature dimension variations to the integrated circuit. The generating includes adjusting the electronic design based on predictions of topographical and topographical-related feature dimension variations by a pattern-dependent model. An RC extraction tool is used in conjunction with the generating and adjusting of the electronic design. The process includes a fabrication process that will impart topographical variation to the integrated circuit and a lithography or etch process. Placement attributes for elements of the integrated circuit are determined.
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Smith Taber H.
White David
Cadence Design Systems Inc.
Dinh Paul
Vista IP Law Group LLP
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