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Selective optical proximity layout design data correction

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
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Selective shielding for multiple exposure masks

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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Semiconductor device

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Semiconductor device manufacturing method, data generating...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Semiconductor integrated circuit device and fabrication...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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Spacer fill structure, method and design structure for...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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Stage yield prediction

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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Structure including transistor having gate and body in...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
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Sub-resolution assist feature to improve symmetry for...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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System and method correcting optical proximity effect using...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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System and method for checking for sub-resolution assist...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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System and method for creating a focus-exposure model of a...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
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System and method for employing patterning process...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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System and method for making photomasks

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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System and method for making photomasks

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
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System and method for model based multi-patterning optimization

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
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System and method of correcting errors in SEM-measurements

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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System and method of predicting problematic areas for...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
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Systems and methods for UV lithography

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
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