Single and multilayer coatings containing aluminum nitride
Single chamber CVD process for thin film transistors
Solution for FSG induced metal corrosion & metal...
Staggered in-situ deposition and etching of a dielectric...
Staggered in-situ deposition and etching of a dielectric...
Staggered in-situ deposition and etching of a dielectric...
Structure and method for incorporating an inductively coupled pl
Substrate heating mechanism
Substrate processing chamber with tunable impedance
Substrate processing methods
Surface potential control in plasma processing of materials
Surface treating method for substrate
Surface-plasma-wave coating technique for dielectric filaments
Surface-treatment method and equipment
System and method for depositing coating of modulated compositio
System and method for modulation of power and power related...
Tantalum and tantalum-based films and methods of making the same
Tantalum and tantalum-based films formed using fluorine-containi
Technique for improving chucking reproducibility
Thermal pyrolysising chemical vapor deposition method for...