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Single and multilayer coatings containing aluminum nitride

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Single chamber CVD process for thin film transistors

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Solution for FSG induced metal corrosion & metal...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Staggered in-situ deposition and etching of a dielectric...

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Staggered in-situ deposition and etching of a dielectric...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Staggered in-situ deposition and etching of a dielectric...

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Structure and method for incorporating an inductively coupled pl

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Substrate heating mechanism

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Substrate processing chamber with tunable impedance

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Substrate processing methods

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Surface potential control in plasma processing of materials

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Surface treating method for substrate

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Surface-plasma-wave coating technique for dielectric filaments

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Surface-treatment method and equipment

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System and method for depositing coating of modulated compositio

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System and method for modulation of power and power related...

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Tantalum and tantalum-based films and methods of making the same

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Tantalum and tantalum-based films formed using fluorine-containi

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Technique for improving chucking reproducibility

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Thermal pyrolysising chemical vapor deposition method for...

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