Surface potential control in plasma processing of materials

Details Surface potential control in plasma processing of materials Surface potential control in plasma processing of materials

1992-12-23

1994-12-20

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427444, 427458, 427523, 427561, B05D 306

Patent

active

053744560

ABSTRACT:
An object (30) is plasma processed by placing an electrically conducting grid (34) over all or a portion of the surface (32) of the object (30) so that the grid (34) generally follows the contours of the surface (32) but is displaced outwardly from the surface (32). Ions or electrons from a plasma surrounding the object (30) are accelerated into the surface (32) of the object (30) using as a processing driving force an electrical potential applied to the electrically conducting grid (34). The use of a contoured conducting grid (34) allows plasma processing of large, electrically nonconducting objects and objects having sharp surface features or recesses.

REFERENCES:
patent: 3583361 (1971-06-01), Laudel
patent: 4764394 (1988-08-01), Conrad
patent: 5133849 (1992-07-01), Kinoshita et al.
patent: 5185067 (1993-02-01), Shibahara
R. G. Wilson et. al, "Secondary Ion Mass Spectrometry, A Practical Handbook for Depth Profiling and Bulk Impurity Analysis", John Wiley & Sons, 1989, p. 4.3.1, Section 4.3. (no month available).

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