Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-04-24
1997-01-21
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118723MW, 4271632, 4272555, 427585, B05D 104
Patent
active
055957935
ABSTRACT:
A method and device is described to generate plasmas on the surface of dielectric filaments and--by a plasma chemical vapor deposition (CVD) mechanism--deposit dielectric films on the filaments as they move through the plasma zone. The plasma generated by plasma surface waves are located only in the vicinity of the filament thus reducing precursor gas consumption, deposition on chamber walls, power requirements. The method is particular suitable for manufacturing dielectric coated optical fibers.
REFERENCES:
patent: 5000541 (1991-03-01), DiMarcello et al.
patent: 5178743 (1993-01-01), Kumar
Blinov Leonid
Neuberger Wolfgang
Ceram Optec Industries Inc.
Pianalto Bernard
Skutnik Bolesh J.
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