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Sequential chemical vapor deposition

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Shallow trench isolation filled by high density plasma chemical

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Sheet plasma CVD apparatus

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Silica microspheres, method for making and assembling same...

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Silicon device production

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Silicon dioxide deposition by plasma activated evaporation...

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Silicon nitride thin films with improved properties

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Silicon nitrogen-based films and method of making the same

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Silicon oxide film formation method

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Silicon oxide film, method of forming the silicon oxide...

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Single and multilayer coatings containing aluminum nitride

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Single chamber CVD process for thin film transistors

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Solution for FSG induced metal corrosion & metal...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Staggered in-situ deposition and etching of a dielectric...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Staggered in-situ deposition and etching of a dielectric...

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Staggered in-situ deposition and etching of a dielectric...

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Structure and method for incorporating an inductively coupled pl

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Substrate heating mechanism

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Substrate processing chamber with tunable impedance

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Substrate processing methods

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