Sheet plasma CVD apparatus

Details Sheet plasma CVD apparatus Sheet plasma CVD apparatus

1991-12-23

1993-06-08

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427569, 118715, 118723, C23C 1648, C23C 1650

Patent

active

052177610

ABSTRACT:
A sheet plasma CVD apparatus for forming a film by generating sheet plasma in parallel with a substrate comprising a gas supply nozzle in opposition to the substrate with the sheet plasma sandwiched therebetween. A source gas supply opening is formed in the center of the gas supply nozzle. A plurality of reaction gas supply openings are formed in the periphery of the source gas supply opening, the source jetted out from the source gas supply opening and the reaction jetted out from the reaction gas supply openings. The source and reaction gases intersect with each other in the sheet plasma.

REFERENCES:
patent: 4131659 (1978-12-01), Authier
patent: 4509451 (1985-04-01), Collins
patent: 4581248 (1986-04-01), Roche
patent: 4838201 (1989-06-01), Fraas

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