Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2011-04-19
2011-04-19
Parker, Frederick J (Department: 1712)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S212000, C427S576000, C427S578000, C065S021100, C065S021300, C065S021400, C065S060100, C065S060500
Reexamination Certificate
active
07927670
ABSTRACT:
The invention concerns silica microspheres (M) having an outer diameter between 50 and 125 μm, preferably between 60 and 90 μm, a wall thickness not less than 1 μm, preferably between 1 and 3 μm and a density between 0.3 and 0.7/cm3, a manufacturing method by injecting silica microsphere precursors (MS, PR1, PR1′, PR2′) into an inductive plasma (P), assembly methods and possible uses of silica microspheres.
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Parker Frederick J
Wieczorek Michael
Young & Thompson
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