Disposable spacer for symmetric and asymmetric Schottky...
Disposable spacer process for field effect transistor...
Disposable spacer technology for device tailoring
Disposable spacer technology for reduced cost CMOS processing
Disposable spacer technology for reduced cost CMOS processing
Disposable spacers for improved array gapfill in high...
Disposable-spacer damascene-gate process for SUB 0.05 &mgr;m...
Distributed constant circuit with active element
Distributed high voltage JFET
DMOS architecture using low N-source dose co-driven with P-body
DMOS device structure, and related manufacturing process
DMOS device with sealed channel processing
DMOS fabrication process implemented with reduced number of mask
DMOS process module applicable to an E.sup.2 CMOS core process
DMOS transistor structure with gate electrode trench for...
Dopant implantation method using multi-step implants
Dopant profile tuning for MOS devices by adapting a spacer...
Doped polysilicon to retard boron diffusion into and through thi
Doped spacer liner for improved transistor performance
Doped structure for finfet devices