Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1998-09-03
2000-05-30
Niebling, John F.
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438262, 438268, H01L 218247
Patent
active
060690348
ABSTRACT:
A DMOS structure is formed with P-body and N-source implantations are self-aligned using the same photoresist mask. Following formation of field isolation structures and removal of the composite nitride, a `double-implantation` of P body and N source is made using a single resist masking stage. This process flow utilizes a relatively low N-source implantation dose, as N-source and P-body implantations are subsequently thermally diffused together (co-driven) using the original thermal budget of the P-body drive-in. The N-source implant thus now sees the same thermal budget as does the P-body implant. As a result in this process scheme, overetching of P-body and N-source during composite nitride removal is eliminated, while process simplicity is conserved. Moreover, channel overlap remains self-aligned by implanting N-source and P-body through the same mask. Differing rates of thermal diffusion of the P and N type dopant determine the extent of channel overlap.
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Murphy John
National Semiconductor Corporation
Niebling John F.
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