Asymmetric source/drain junctions for low power silicon on...
Asymmetric-area memory cell
Asymmetrical devices for short gate length performance with...
Asymmetrical IGFET devices with spacers formed by HDP...
Asymmetrical MOSFET layout for high currents and high speed...
Asymmetrical MOSFET with gate pattern after source/drain formati
Asymmetrical p-channel transistor formed by nitrided oxide and l
Asymmetrical P-channel transistor having a boron migration barri
Asymmetrical transistor formed from a gate conductor of unequal
Atomic layer deposited nanolaminates of HfO 2 /ZrO 2 films...
Atomic layer deposited nanolaminates of HfO2/ZrO2 films as...
Atomic layer deposited ZrAl x O y dielectric layers...
Atomic layer deposition of hafnium lanthanum oxides
Atomic layer deposition of interpoly oxides in a...
Atomic layer deposition of Zr 3 N 4 /ZrO 2 films as gate...
Atomic layer deposition of Zr x Hf y Sn 1-x-y O 2 films...
Atomic layer deposition of Zr x Hf y Sn 1-x-y O 2 films...
Atomic layer deposition processes for non-volatile memory...
Atomic layer deposition processes for non-volatile memory...
Atomic layer-deposited LaAlO3 films for gate dielectrics