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III-V nitride substrate boule and method of making and using...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Involving nuclear transmutation doping
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Image sensor and method of fabricating the same

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Image sensor with improved charge transfer efficiency and...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Image sensor with improved charge transfer efficiency and...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Implant damage removal by laser thermal annealing

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
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Implantation at elevated temperatures for amorphization...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Implantation of deuterium in MOS and DRAM devices

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Implantation of gate regions in semiconductor device...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Implantation of multiple species to address copper reliability

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Implantation process in semiconductor fabrication

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Implanted barrier layer for retarding upward diffusion of...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Impurity doping method

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Plasma
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In-situ boron doped polysilicon with dual layer and dual grain s

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
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In-situ diffusion of dopant impurities during dendritic web grow

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
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In-situ doped silicon layers

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
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Incorporation of an impurity into a thin film

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into...
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Increasing the electrical activation of ion-implanted dopants

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Integrated circuit asymmetric transistors

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Integrated circuit device and fabrication using metal-doped...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Plasma
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Integrated circuit having double bottom anti-reflective...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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