In-situ doped silicon layers

Details In-situ doped silicon layers In-situ doped silicon layers

1996-08-30

1999-10-12

Whitehead, Jr., Carl

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

Diffusing a dopant

438543, 438488, 438297, 438778, H01L 2122

Patent

active

059666277

ABSTRACT:
A method and apparatus for the manufacture of integrated circuits including the placement of a single tube for introduction of dopant gases into a process chamber is disclosed.

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