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Gallium nitride semiconductor device

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

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Gas immersion laser annealing method suitable for use in the fab

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Gate electrode dopant activation method for semiconductor...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Gate formation method for reduced poly-depletion and boron...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Gate interface relaxation anneal method for wafer processing...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into...
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Gettering technique for wafers made using a controlled...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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