Reduction of plasma damage for HDP-CVD PSG process
Reduction of polysilicon contact resistance by nitrogen implanta
Reduction of shrinkage of poly(arylene ether) for low-K IMD
RELACS process to double the frequency or pitch of small...
Relaxed SiGe platform for high speed CMOS electronics and...
Relaxed silicon germanium platform for high speed CMOS...
Remote plasma activated nitridation
Remote plasma nitridation to allow selectively etching of oxide
Remote plasma source seasoning
Removable amorphous carbon CMP stop
Removable amorphous carbon CMP stop
Removable amorphous carbon CMP stop
Removal of carbon from an insulative layer using ozone
Repair and restoration of damaged dielectric materials and...
Repair of carbon depletion in low-k dielectric films
Replenishment of surface carbon and surface passivation of...
Replenishment of surface carbon and surface passivation of...
Replication and transfer of microstructures and nanostructures
Replication and transfer of microstructures and nanostructures
Replication and transfer of microstructures and nanostructures