Replication and transfer of microstructures and nanostructures

Details Replication and transfer of microstructures and nanostructures Replication and transfer of microstructures and nanostructures

2011-07-19

2011-07-19

Nhu, David (Department: 2895)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S048000, C438S792000, C257SE21007, C257SE21170, C257SE21320, C257SE21134, C257SE21218, C257SE21229, C257SE21347, C257SE21348

Reexamination Certificate

active

07981814

ABSTRACT:
A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.

REFERENCES:
patent: 4810547 (1989-03-01), Minami et al.
patent: 5629579 (1997-05-01), Zimmerman
patent: 6027595 (2000-02-01), Suleski et al.
patent: 6375870 (2002-04-01), Visovsky et al.
patent: 6518194 (2003-02-01), Winningham et al.
patent: 6656568 (2003-12-01), Winningham et al.
patent: 6744909 (2004-06-01), Kostrzewski et al.
patent: 7125639 (2006-10-01), Schaper
patent: 7345002 (2008-03-01), Schaper
patent: 2002/0071943 (2002-06-01), Hawker et al.
patent: 1001311 (2000-05-01), None
patent: 1003078 (2000-05-01), None
patent: 62-211145 (1987-09-01), None
patent: 63275053 (1988-11-01), None
patent: 2145326 (1990-06-01), None
patent: WO 97/06012 (1997-02-01), None
patent: WO 97/06013 (1997-02-01), None
patent: WO 02/068167 (2002-09-01), None
Xiao et al. “Fabrication of microstamps used for oligonucleotide arrays synthesis.” Micromachining and Microfabrication Process Technology and Devices. Proceedings of SPIE, vol. 4601 (2001), pp. 401-405.
Stephen Chou, Peter Krauss, & Preston Renstrom. “Imprint Lithography with 25-Nanometer Resolution”, Science vol. 272, Apr. 5, 1996 pp. 85-87, USA.
Stephen Chou, Peter Krauss, & Preston Renstrom. “Nanoimprint Lithography”, Journal of Vacuum Science & Technology B vol. 14(6), Nov./Dec. 1996 pp. 4129-4133, USA.
Babak Heidari, Ivan Maximov, Eva-Lena Sarwe, & Lars Montelius, “Large scale nanolithography using nanoimprint lithography”, Journal of Vacuum Science & Technology B vol. 17(6), Nov./Dec. 1999 pp. 2962-2964, USA.
Jan Haisma, Martin Verheuen, Kees Van Den Heuvel, & Jan Van Den Berg, “Mold-assisted nanolithography: A process for reliable pattern replication”, Journal of Vacuum Science & Technology B vol. 14(6), Nov./Dec. 1996 pp. 4124-4128, USA.
Thomas Whidden, David Ferry, Michael Kozicki, Enoch Kim, Amit Kumar, James Wilbur, & George Whitesides, “Pattern transfer to silicon by microcontact and RIE”, in Nanotechnology vol. 7, 1996, pp. 447-451, UK.
James Wilbur, Amit Kumar, Hans Biebuyck, Enoch Kim, & George Whitesides, “Microcontact printing of self-assembled monolayers: applications in microfabrication”, in Nanotechnology vol. 7, 1996, pp. 452-457, UK.
Younan Xia & George Whitesides, “Soft lithography”, in Annual Reviews of Material Science vol. 28, 1998, pp. 153-184, USA.
Shinichi Ueki, Isao Ashida, & Hiroichi Kawahira, “New data processing of dummy pattern generation adaptive for CMP process”, in Photomask and X-Ray mask Technology VI, H. Morimoto, ed. Proceedings of the SPIE vol. 3748, Apr. 1999 pp. 265-272, USA.
M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Tailey, B. Choi, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J. Ekerdt, & C. Grant Willson, “Step and flash imprint lithography: A new approach to high-resolution printing”, in Emerging Lithographic Technologies III, Y. Vladimirsky, ed. Proceedings of the SPIE vol. 3676, Mar. 1999, pp. 379-389, USA.
P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, S. Damle, M. Stewart, J. Ekerdt, S.V. Sreenivasan, J.C. Wolfe, & C. Grant Willson, “Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography”, Journal of Vacuum Science & Technology B vol. 17(6), Nov./Dec. 1996 pp. 2965-2969, USA.

Affiliated with

Also associated with

Rating

Replication and transfer of microstructures and nanostructures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Replication and transfer of microstructures and nanostructures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Replication and transfer of microstructures and nanostructures will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2633520