Remote plasma source seasoning

Details Remote plasma source seasoning Remote plasma source seasoning

2011-08-02

2011-08-02

Quach, Tuan N. (Department: 2893)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S792000, C438S905000, C257SE21278, C427S574000

Reexamination Certificate

active

07989365

ABSTRACT:
Methods of seasoning a remote plasma system are described. The methods include the steps of flowing a silicon-containing precursor into a remote plasma region to deposit a silicon containing film on an interior surface of the remote plasma system. The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition.

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