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Simultaneous formation of device and backside contacts on...

Semiconductor device manufacturing: process – Chemical etching
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Single and multilevel rework

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Single mask trench fred with enlarged Schottky area

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Single RIE process for MIMcap top and bottom plates

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Single step electroplating process for interconnect via fill and

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Single step etched moat

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Single wafer etching method

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Single wafer in-situ dry clean and seasoning for plasma...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Single workpiece processing system

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Single workpiece processing system

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Single workpiece processing system

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Single-layer-electrode type charge coupled device having double

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Site-specific method for large area uniform thickness plan...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Slotted electrostatic shield modification for improved etch...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Slurries for mechanical or chemical-mechanical planarization of

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Slurries of abrasive inorganic oxide particles and method...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Slurries of abrasive inorganic oxide particles and method...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Slurry and method for chemical mechanical polishing of copper

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Slurry composition for chemical-mechanical polishing capable...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Slurry composition for use in chemical mechanical polishing...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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