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Method for adjusting a critical dimension in a high aspect...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for an integrated circuit contact

Semiconductor device manufacturing: process – Chemical etching
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Method for an integrated circuit contact

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Method for an integrated circuit contact

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Method for an integrated circuit contact

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Method for anchoring via/contact in semiconductor devices and de

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for anisotropic plasma etching of semiconductors

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Method for anisotropic plasma etching using...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for anisotropic plasma-chemical dry etching of...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for anisotropically etching tungsten using SF.sub.6, CHF.

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for appraising the condition of a semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for assaying elements in a substrate for optics,...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for atomic layer deposition of materials using a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for avoiding carbon and nitrogen contamination of a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for avoiding defects produced in the CMP process

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for avoiding erosion of conductor structure during...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Method for avoiding microscratch in interlevel dielectric...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for avoiding notching in a semiconductor interconnect...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for avoiding oxide undercut during pre-silicide clean...

Semiconductor device manufacturing: process – Chemical etching – Having liquid and vapor etching steps
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Method for avoiding the fluorination of the metal contact of...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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