Selective plasma etching of silicon nitride in presence of silic
Selective removal of TixNy
Selective SAC etch process
Selective surface exposure, cleans and conditioning of the...
Selectively converted inter-layer dielectric
Selectivity oxide-to-oxynitride etch process using a...
Self aligned method to define features smaller than the resoluti
Self alignment process to fabricate attenuated shifting mask...
Self-aligned contact (SAC) etch with dual-chemistry process
Self-aligned contact process implementing bias compensation...
Self-aligned contact structure
Self-aligned contacts for semiconductor device
Self-aligned contacts for semiconductor device
Self-aligned dual damascene arrangement for metal...
Self-aligned dual damascene arrangement for metal...
Self-aligned eetching process
Self-aligned etch-stop layer formation for semiconductor...
Self-aligned PECVD etch mask
Self-aligned PECVD etch mask
Self-aligned stack formation