Control of ion angular distribution function at wafer surface

Control of semiconductor processing

Controlled etching of oxides via gas phase reactions

Controlled method for segmented electrode apparatus and...

Controlled polymerization on plasma reactor wall

Controlled potential plasma source

Controlling plasma processing using parameters derived...

Copper-clad board suitable for making hole with carbon...

Critical dimension control in a semiconductor fabrication...

Cyanuric fluoride and related compounds for anisotropic etching

Dechucking method and apparatus for workpieces in vacuum...

Deformation reduction at the main chamber

Detection method of coating film thickness and ion...

Detection of hardmask removal using a selective etch

Determining endpoint in etching processes using principal...

Device and method for anisotropic plasma etching of a...

Device and method for etching a substrate using an...

Device and method for processing a plasma to alter the surface o

Device transfer method

Diamond-like carbon for use in VLSI and ULSI interconnect system