Detection of hardmask removal using a selective etch

Details Detection of hardmask removal using a selective etch Detection of hardmask removal using a selective etch

2006-01-24

2006-01-24

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C213S013000, C213S017000, C213S018000, C438S706000, C438S723000

Reexamination Certificate

active

06989105

ABSTRACT:
A method of creating electrical shorts within an interconnection structure, using a selective etch, to detect a region that is missing a protective hardmask in order to prevent future use of the defective device.

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