Coating for forming a high definition aperture

Details Coating for forming a high definition aperture Coating for forming a high definition aperture

2006-12-12

2006-12-12

Norton, Nadine (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

Etching inorganic substrate

C216S076000, C216S101000

Reexamination Certificate

active

07147794

ABSTRACT:
An optical thin film stack for a dark aperture is deposited using thermal ion-assisted deposition (“IAD”). The IAD provides an energetic deposition of chromium and chromium oxide that results in a dark mirror optical thin film stack with superior etch properties. Edge definition is improved, and the edge profile is controllable by the selection of IAD parameters. An in situ IAD cleaning process can be used to clean the substrate sufficiently so that an intermediate adhesion layer of chromium is not required.

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