Contaminant removal by laser-accelerated fluid

Details Contaminant removal by laser-accelerated fluid Contaminant removal by laser-accelerated fluid

2005-06-21

2005-06-21

Vinh, Lan (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C216S060000, C216S065000, C134S001100

Reexamination Certificate

active

06908567

ABSTRACT:
A method for removing a particle from a substrate includes forming a layer of a fluid on a surface of an optical element and positioning the optical element in proximity to a location of the particle on the substrate. A pulse of electromagnetic radiation is directed to impinge on the surface of the optical element so as to induce explosive evaporation of the fluid thereon, whereby a pressure wave is emitted toward the location of the particle.

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