Composite shadow ring equipped with a sacrificial inner ring

Details Composite shadow ring equipped with a sacrificial inner ring Composite shadow ring equipped with a sacrificial inner ring

1998-08-28

2000-09-12

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

438729, 156345, H01L 2100, H05H 100

Patent

active

061173495

ABSTRACT:
A composite shadow ring for use in a plasma etch chamber that has a longer service life and can be readily replaced at a lower cost and a method for using such ring are disclosed. The composite shadow ring is constructed by a larger outer ring and a smaller inner ring which may be fabricated of quartz. The smaller inner ring has an upper planar surface for partially supporting an edge of an wafer and for exposing substantially to the gas plasma in the etch chamber. When the upper planar surface of the smaller inner ring is corroded by the gas plasma, the inner ring may be turned upside-down and reused, or when both sides have been corroded it can be readily replaced at a low cost without replacing the more expensive outer ring. The present invention composite shadow ring therefore presents a substantially lower cost shadow ring for use in an etching process than that possible with the conventional quartz shadow rings.

REFERENCES:
patent: 5955381 (1999-09-01), Bitting et al.

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