Capture system employing diverter fluid nozzle

Details Capture system employing diverter fluid nozzle Capture system employing diverter fluid nozzle

1994-04-01

1996-01-23

Padgett, Marianne

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 8, 216 25, 216 66, 1566431, 427555, 427534, 427552, 15302, 153121, 15345, 137814, 239106, 239433, 21912166, 21912169, 21912184, B55, H01L 21306, B23K 2600, A47L 514

Patent

active

054859352

ABSTRACT:
A method and apparatus are disclosed for capturing coating debris during laser ablation of a photoreceptor comprising: (a) enclosing a predetermined length of a coated substrate in a housing to result in an enclosed coated substrate portion, wherein there exists a gap between the enclosed substrate portion and the housing in communication with air outside the housing; (b) directing high energy radiation at the coating of the enclosed substrate portion; (c) directing a first fluid stream against the coating of the enclosed substrate portion to remove at least part of the coating in the form of coating debris during or subsequent to (b), whereby the first fluid stream may move a portion of the coating debris outside the housing in the absence of (d); (d) directing a second fluid stream against the first fluid stream in a direction effective for keeping the coating debris inside the housing, thereby minimizing movement of the coating debris into the air outside the housing; and (e) exhausting the coating debris.

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"Lift-Off Stencil Created by Laser Ablation", IBM Technical Disclosure Bulletin, vol. 28, No. 5, Oct. 1985, p. 2034.

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